描述
产品简要说明
ASML 2500 5000 PSCOPE CAMERA 4022.428.05233 22052358是ASML专为光刻机设计的高分辨率实时检测摄像头，核心特性包括：
亚微米级成像精度：采用CMOS全局快门传感器，单像素尺寸≤0.8μm，分辨率≥8K（7680×4320）。
实时缺陷检测：支持120Hz帧率，结合AI算法实现晶圆表面缺陷的毫秒级识别。
洁净室级防护：通过Class 1洁净室认证，气密性等级IP68，抗静电等级ESD 15kV。
产品详细说明
1.技术架构与核心功能
光学成像系统：
镜头组采用非球面透镜与偏振滤光片组合，消除光刻机激光的杂散光干扰。
集成LED照明模块（波长405nm/450nm可切换），支持明场/暗场双模式成像。
传感器与处理单元：
全局快门CMOS传感器（索尼IMX500系列），量子效率≥85%（405nm波长）。
FPGA实时图像预处理，支持噪声抑制、边缘增强与缺陷特征提取。
环境适应性：
真空封装设计，内部气压<1e-4 mbar，减少空气折射率波动影响。
铝合金框架与钛合金散热片，热膨胀系数（CTE）匹配光刻机基座（1.3ppm/℃）。
2.性能突破
动态响应能力：
支持2000线/秒的晶圆扫描速度，图像采集延迟<2ms。
抗干扰能力：
屏蔽层采用铜-镍复合结构，电磁屏蔽效能达80dB（1MHz～1GHz）。
能效优化：
动态功耗管理技术，待机功耗≤3W，运行功耗≤20W。
技术规格:ASML 2500 5000 PSCOPE CAMERA 4022.428.05233 22052358
参数项规格描述
分辨率7680×4320像素
帧率120Hz（全分辨率模式）
量子效率≥85% 405nm
工作温度20℃±0.3℃（恒温控制）
真空环境内部气压<1e-4 mbar
接口类型Camera Link HS Gen2（带宽≥10Gbps）
功耗≤20W（运行模式）
核心价值与性能亮点
1.极端环境适应性
真空环境稳定性：采用无油润滑机械结构，避免污染光学元件。
低温恒温设计：内置热电制冷模块，温度波动≤0.03℃，确保传感器热噪声<5e-6 DN。
2.多场景扩展性
跨代兼容性：适配ASML NXE 3800E及后续High-NA EUV光刻机。
工业互联网集成：支持OPC UA协议，可与光刻机控制系统实时同步检测结果。
3.全生命周期成本优化
自清洁功能：内置紫外杀菌模块，减少镜头污染维护频率。
模块化更换：传感器与镜头组件可独立更换，维修成本降低40%。
Product brief description
ASML 2500 5000 PSCOPE CAMERA 4022.428.05233 22052358 is a high-resolution real-time detection camera designed by ASML for lithography machines.The core features include:
Submicron-level imaging accuracy:CMOS global shutter sensor is used,with a single pixel size of≤0.8μm and a resolution of≥8K(7680×4320).
Real-time defect detection:supports 120Hz frame rate,and combines AI algorithm to achieve millisecond recognition of wafer surface defects.
Clean room-level protection:passed Class 1 clean room certification,airtightness level IP68,antistatic level ESD 15kV.
Product details
1.Technical architecture and core functions
Optical imaging system:
The lens group uses an aspherical lens and a polarization filter to eliminate stray light interference from the photolithography machine laser.
Integrated LED lighting module(wavelength 405nm/450nm can be switched)supports bright field/dark field dual-mode imaging.
Sensor and processing unit:
Global shutter CMOS sensor(Sony IMX500 series),quantum efficiency≥85%(405nm wavelength).
FPGA real-time image preprocessing supports noise suppression,edge enhancement and defect feature extraction.
Environmental adaptability:
Vacuum package design,internal air pressure<1e-4 mbar,reducing the influence of air refractive index fluctuations.
The aluminum alloy frame and titanium alloy heat sink,the thermal expansion coefficient(CTE)matches the base of the lithography machine(1.3ppm/℃).
2.Performance breakthrough
Dynamic response capability:
Supports wafer scanning speed of 2000 lines/second,and image acquisition delay is<2ms.
Anti-interference ability:
The shielding layer adopts a copper-nickel composite structure,and the electromagnetic shielding effect is 80dB(1MHz~1GHz).
Energy efficiency optimization:
Dynamic power consumption management technology,standby power consumption≤3W,and running power consumption≤20W.
Technical Specifications:ASML 2500 5000 PSCOPE CAMERA 4022.428.05233 22052358
Parameters Specification Description
Resolution 7680×4320 pixels
Frame rate 120Hz(full resolution mode)
Quantum efficiency≥85% 405nm
Working temperature:20℃±0.3℃(constant temperature control)
Vacuum environment Internal air pressure<1e-4 mbar
Interface type Camera Link HS Gen2(bandwidth≥10Gbps)
Power consumption≤20W(operating mode)
Core Valuesand Performance Highlights
1.Extreme environmental adaptability
Vacuum environment stability:oil-free lubricating mechanical structure is adopted to avoid contamination of optical components.
Low temperature constant temperature design:built-in thermoelectric refrigeration module,temperature fluctuation is≤0.03℃,ensuring sensor thermal noise is<5e-6 DN.
2.Multi-scene scalability
Cross-generation compatibility:adapted to ASML NXE 3800E and subsequent High-NA EUV lithography machines.
Industrial Internet integration:supports OPC UA protocol,and can synchronize the detection results in real time with the lithography machine control system.
3.Full life cycle cost optimization
Self-cleaning function:built-in UV sterilization module to reduce lens pollution maintenance frequency.
Modular replacement:The sensor and lens assembly can be replaced independently,reducing maintenance costs by 40%.
