描述
产品简要说明
ASML 4022.436.3027 CN3是ASML光刻机光学系统的核心校准模块，专为先进制程芯片制造设计。其核心功能包括：
波前补偿：实时校正光束相位误差，补偿精度≤0.01λ（RMS）。
动态校准：支持多光束干涉技术，曝光均匀性误差≤0.2%。
环境适应性：兼容真空（<1e-6 mbar）与超低温（-196℃）工作环境。
产品详细说明
1.技术架构与核心功能
波前校准系统：
传感器阵列：基于Shack-Hartmann的高密度探测器（分辨率≥1000×1000像素），采样频率≥1kHz。
自适应算法：神经网络驱动的相位预测模型，响应时间≤10ms。
多光束协同控制：
支持4束极紫外光（EUV）同步校准，光束重叠误差≤0.5nm。
光束偏振度动态调整范围≥95%-99.8%。
环境适应模块：
真空密封系统（氦气渗透率≤1e-12 Pa·m³/s）。
超低温冷却（液氮循环，温度波动≤0.01℃）。
2.性能突破
极紫外光补偿：
在13.5nm波长下，相位误差补偿效率≥99.5%。
抗干扰能力：
机械振动隔离效率≥98%（频段1-500Hz）。
长寿命设计：
传感器阵列寿命≥5e6次校准循环。
真空密封系统可靠性≥99.99%（MTBF≥10万小时）。
技术规格:ASML 4022.436.3027 CN3
参数项规格描述
波前补偿精度≤0.01λ（RMS， 13.5nm）
环境温度-196℃至25℃
光束均匀性≤0.2%（RMS）
接口协议ASML专用光学控制协议（OCP 6.0）
核心价值与性能亮点
1.先进制程适配
3nm以下制程支持：通过动态波前补偿，单次曝光分辨率≤3nm（half-pitch）。
多光束协同优化：支持高数值孔径（NA≥0.55）光学系统，提升光刻效率15%-20%。
2.极端环境兼容性
真空与低温集成：
真空环境下光束传输损耗≤0.01%/米。
超低温下材料热膨胀系数（CTE）≤0.02ppm/℃。
3.生态协同创新
ASML NXE 3600D适配：兼容其新型光学架构（如多层反射镜堆叠系统）。
未来扩展接口：预留0.7 NA光学系统的升级通道。
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Product brief description
ASML 4022.436.3027 CN3 is the core calibration module of the ASML lithography machine optical system,designed for advanced process chip manufacturing.Its core functions include:
Wavefront compensation:Correct the beam phase error in real time,and the compensation accuracy is≤0.01λ(RMS).
Dynamic calibration:supports multi-beam interference technology,with exposure uniformity error≤0.2%.
Environmental adaptability:Compatible with vacuum(<1e-6 mbar)and ultra-low temperature(-196°C)working environment.
Product details
1.Technical architecture and core functions
Wavefront calibration system:
Sensor array:Shack-Hartmann-based high-density detector(resolution≥1000×1000 pixels),sampling frequency≥1kHz.
Adaptive algorithm:a phase prediction model driven by neural network,with a response time of≤10ms.
Multi-beam collaborative control:
Supports 4 beams of extreme ultraviolet light(EUV)synchronous calibration,with beam overlap error≤0.5nm.
The dynamic adjustment range of beam polarization is≥95%-99.8%.
Environment adaptation module:
Vacuum sealing system(helium permeability≤1e-12 Pa·m³/s).
Ultra-low temperature cooling(liquid nitrogen cycle,temperature fluctuation≤0.01℃).
2.Performance breakthrough
Extreme UV Compensation:
At 13.5nm wavelength,the phase error compensation efficiency is≥99.5%.
Anti-interference ability:
Mechanical vibration isolation efficiency is≥98%(frequency band 1-500Hz).
Long life design:
Sensor array life is≥5e6 calibration cycles.
The reliability of the vacuum sealing system is≥99.99%(MTBF≥100,000 hours).
Technical specifications:ASML 4022.436.3027 CN3
Parameters Specification Description
Wavefront compensation accuracy≤0.01λ(RMS, 13.5nm)
Ambient temperature-196℃to 25℃
Beam uniformity≤0.2%(RMS)
Interface protocol ASML dedicated optical control protocol(OCP 6.0)
Core Valuesand Performance Highlights
1.Advanced process adaptation
The following 3nm process supports:through dynamic wavefront compensation,the single exposure resolution is≤3nm(half-pitch).
Multi-beam collaborative optimization:supports high numerical aperture(NA≥0.55)optical systems,improving lithography efficiency by 15%-20%.
2.Extreme environmental compatibility
Vacuum and low temperature integration:
The beam transmission loss in vacuum environment is≤0.01%/meter.
The thermal expansion coefficient(CTE)of the material at ultra-low temperature is≤0.02ppm/℃.
3.Ecological collaborative innovation
ASML NXE 3600D adaptation:compatible with its new optical architectures(such as multi-layer mirror stacking systems).
Future expansion interface:reserve the upgrade channel for 0.7 NA optical system.
