描述
产品简要说明
ASML 4022.470.0891 CCM是ASML High NA EUV光刻机的核心闭环控制模块，专为3nm及以下先进制程设计。其核心功能包括：
纳米级运动控制：定位精度≤0.1nm（3σ），重复性≤0.05nm。
实时反馈系统：闭环响应时间≤1ms，动态误差补偿≥99.99%。
多物理场协同控制：集成温度、压力、电磁干扰等参数的实时监测与调节。
产品详细说明
1.核心架构设计
六自由度闭环控制单元：
运动控制芯片：基于FPGA的实时计算架构，指令执行延迟≤0.1μs。
多轴耦合补偿：消除X/Y/Z轴交叉耦合误差，补偿效率≥99.9%。
环境自适应系统：
温度补偿算法：实时修正热膨胀效应，温度漂移控制≤0.002℃/min。
气压平衡模块：真空环境压力波动≤0.001 Pa，响应时间≤0.5ms。
2.智能控制算法
动态反馈模型：
预测性控制：基于LSTM神经网络的未来运动轨迹预测，误差预判精度≥99.9%。
自适应滤波：消除机械振动与电磁噪声干扰，信噪比提升至120dB。
多模态数据融合：
传感器阵列：集成光纤激光干涉仪、压电传感器与电容位移计，数据采样率1MHz。
实时决策引擎：通过边缘计算实现毫秒级控制指令生成。
3.抗干扰与可靠性设计
电磁屏蔽系统：
多层屏蔽层：磁场干扰抑制≥100dB，电场波动≤0.1V/m。
抗辐射加固：单粒子效应（SEU）耐受性提升至10^14 neq/cm²。
冗余容错机制：
双通道控制冗余：主备控制链路切换时间≤0.1ms。
故障自诊断：实时监测100+关键参数，故障定位准确率≥99.9%。
技术规格:ASML 4022.470.0891 CCM
参数项规格描述
定位精度≤0.1nm（3σ）
闭环响应时间≤1ms
环境适应性温度：25℃±0.005℃；真空度：≤1e-12 Pa
抗干扰能力电磁屏蔽≥100dB，振动抑制≥99.9%
Product brief description
ASML 4022.470.0891 CCM is the core closed-loop control module of ASML High NA EUV lithography machine,specially designed for advanced processes under 3nm and below.Its core functions include:
Nano-level motion control:positioning accuracy≤0.1nm(3σ),repeatability≤0.05nm.
Real-time feedback system:closed-loop response time≤1ms,dynamic error compensation≥99.99%.
Multi-physics coordinated control:integrate real-time monitoring and adjustment of parameters such as temperature,pressure,electromagnetic interference,etc.
Product details
1.Core architecture design
Six-degree-of-freedom closed-loop control unit:
Motion control chip:a real-time computing architecture based on FPGA,with instruction execution delay≤0.1μs.
Multi-axis coupling compensation:eliminates the X/Y/Z axis cross-coupling error,and the compensation efficiency is≥99.9%.
Environmental adaptive system:
Temperature compensation algorithm:correct the thermal expansion effect in real time,and temperature drift control is≤0.002℃/min.
Air pressure balance module:vacuum ambient pressure fluctuation≤0.001 Pa,response time≤0.5ms.
2.Intelligent control algorithm
Dynamic feedback model:
Predictive control:Based on the prediction of future motion trajectory of LSTM neural network,the error prediction accuracy is≥99.9%.
Adaptive filtering:eliminates interference between mechanical vibration and electromagnetic noise,and increases the signal-to-noise ratio to 120dB.
Multimodal data fusion:
Sensor array:Integrated fiber laser interferometer,piezoelectric sensor and capacitive displacement meter,data sampling rate of 1MHz.
Real-time decision-making engine:realizes millisecond-level control instruction generation through edge computing.
3.Anti-interference and reliability design
Electromagnetic shielding system:
Multi-layer shielding layer:magnetic field interference suppression≥100dB,electric field fluctuations≤0.1V/m.
Radiation Resistance:Single-particle Effect(SEU)tolerance increased to 10^14 neq/cm².
Redundant fault tolerance mechanism:
Dual-channel control redundancy:the switching time of the main and standby control link is≤0.1ms.
Fault self-diagnosis:Real-time monitoring of 100+key parameters,and the fault positioning accuracy rate is≥99.9%.
Technical Specifications:ASML 4022.470.0891 CCM
Parameters Specification Description
Positioning accuracy≤0.1nm(3σ)
Closed loop response time≤1ms
Environmental adaptability Temperature:25℃±0.005℃;vacuum:≤1e-12 Pa
Anti-interference ability:electromagnetic shielding≥100dB,vibration suppression≥99.9%
