描述
产品简要说明
ASML 879-8103-001A是一款专为浸润式光刻机设计的高精度控制电路板，核心功能包括：
纳米级液位控制：支持浸液槽液位波动≤0.5nm，纯度达Class 1（ISO 14644标准）。
多物理量闭环控制：集成温度传感器（±0.1℃精度）、压力传感器（±0.01MPa精度）与流量计（±0.5%FS），闭环响应时间≤20μs。
抗污染设计：通过ASML内部洁净度认证（ASML-Cleanliness Level 5），微粒排放≤0.001个/m³（0.1μm）。
产品详细说明
1.技术架构与创新
分布式控制架构：
多核协同处理：采用双ARM Cortex-R5（主频800MHz）+Xilinx Artix-7 FPGA，分别负责实时控制与数据处理。
硬件加速单元：内置专用PID控制器，液位调节响应速度提升30%。
通信协议栈：
EtherCAT主站：支持动态从站配置，节点间同步误差≤40ns。
ASML私有协议：兼容光刻机工艺参数库（包含500+浸液工艺包）的实时加载。
2.核心功能模块
浸液系统控制：
动态液位补偿：基于流体力学模型的实时补偿算法，液位波动补偿精度达0.05nm。
纯度保障机制：集成超声波清洗模块与在线离子检测仪，纯度维持时间≥1000小时。
安全控制机制：
三重冗余设计：主控板、扩展板、安全模块独立运行，故障切换时间<1ms。
紧急排液系统：支持ASML安全等级（ASML Safety Level 6），排液响应时间≤50ms。
3.行业应用适配性
浸润式光刻机：
浸液槽控制：驱动精密泵实现±50μm液位调节，液位抖动≤0.1nm（RMS）。
洁净室兼容性：通过ISO 14644-1 Class 0洁净室认证，微粒捕获效率≥99.9999%。
微纳加工设备：
多流体协同控制：同步管理水、异丙醇、去离子水三种液体，切换精度≤0.1ml。
温度补偿：集成热敏电阻阵列，实时补偿环境温度变化（补偿范围-5℃至5℃）。
技术规格:ASML 879-8103-001A
参数项规格描述
支持流体通道数3通道（水/异丙醇/去离子水），可扩展至6通道（需外接扩展模块）
通信协议EtherCAT、ASML-IPC、Profinet IRT
主站刷新周期≤80μs（EtherCAT）
工作温度20℃±0.5℃（恒温控制模式）
功耗≤30W（连续运行）
Product brief description
ASML 879-8103-001A is a high-precision control circuit board designed for immersive lithography machines.The core functions include:
Nano-level liquid level control:Supports liquid level fluctuations in the liquid inlet tank≤0.5nm,and the purity reaches Class 1(ISO 14644 standard).
Multi-physical quantity closed-loop control:integrated temperature sensor(±0.1℃accuracy),pressure sensor(±0.01MPa accuracy)and flowmeter(±0.5%FS),closed-loop response time≤20μs.
Anti-pollution design:Passed ASML-Cleanliness Level 5,and particulate emissions are≤0.001 pieces/m³(0.1μm).
Product details
1.Technical Architecture and Innovation
Distributed control architecture:
Multi-core collaborative processing:Dual ARM Cortex-R5(main frequency 800MHz)+Xilinx Artix-7 FPGAs are used,which are responsible for real-time control and data processing respectively.
Hardware acceleration unit:built-in dedicated PID controller,and the response speed of liquid level adjustment is increased by 30%.
Communication protocol stack:
EtherCAT master:supports dynamic slave configuration,and the synchronization error between nodes is≤40ns.
ASML private protocol:compatible with the real-time loading of the lithography machine process parameter library(including 500+liquid immersion process packages).
2.Core functional modules
Immersion system control:
Dynamic liquid level compensation:a real-time compensation algorithm based on the fluid mechanics model,the liquid level fluctuation compensation accuracy reaches 0.05nm.
Purity assurance mechanism:Integrated ultrasonic cleaning module and online ion detector,purity maintenance time≥1000 hours.
Safety control mechanism:
Triple redundant design:main control board,expansion board,and security module operate independently,failover time<1ms.
Emergency drainage system:supports ASML safety level(ASML Safety Level 6),and the drainage response time is≤50ms.
3.Industry application adaptability
Immersive lithography machine:
Immersion tank control:drive precision pump to achieve±50μm liquid level adjustment,liquid level jitter≤0.1nm(RMS).
Clean room compatibility:Passed ISO 14644-1 Class 0 clean room certification,particle capture efficiency≥99.9999%.
Micro-nano processing equipment:
Multi-fluid collaborative control:synchronously manage three liquids:water,isopropanol,and deionized water,with a switching accuracy of≤0.1ml.
Temperature compensation:Integrated thermistor array,compensates for ambient temperature changes in real time(compensation range-5℃to 5℃).
Technical Specifications:ASML 879-8103-001A
Parameters Specification Description
Supports the number of fluid channels:3 channels(water/isopropanol/deionized water),can be expanded to 6 channels(external expansion module required)
Communication Protocols EtherCAT,ASML-IPC,Profinet IRT
Main site refresh cycle≤80μs(EtherCAT)
Working temperature:20℃±0.5℃(constant temperature control mode)
Power consumption≤30W(continuous operation)
