描述
产品简要说明
ASML 879-8103-002是一款专为浸润式光刻机设计的光学元件温控核心模块，核心功能包括：
亚纳米级热场调控：支持光学透镜组温度波动≤0.001℃，热漂移补偿精度达0.03nm。
多维度闭环控制：集成红外热成像阵列（空间分辨率0.1mm）、压电陶瓷加热器（响应时间<1μs）与激光测温仪（精度±0.0005℃）。
抗干扰设计：通过ASML电磁兼容性认证（EMC Class 6），抗外部电磁干扰能力达100V/m。
产品详细说明
1.技术架构与创新
分布式热管理系统：
多核协同处理：采用双ARM Cortex-M7（主频400MHz）+Xilinx Zynq UltraScale+MPSoC，分别负责实时温度监测与算法计算。
硬件加速单元：内置专用PID控制器，热场响应速度提升40%。
通信协议栈：
EtherCAT主站：支持动态从站配置，节点间同步误差≤30ns。
ASML私有协议：兼容光刻机工艺参数库（包含800+温控工艺包）的实时加载。
2.核心功能模块
光学元件温控：
动态热场补偿：基于有限元分析的实时补偿算法，热漂移补偿精度达0.03nm。
纯度保障机制：集成激光诱导击穿光谱（LIBS）检测，透镜表面污染物浓度控制≤10^10 atoms/cm²。
安全控制机制：
双冗余设计：主控板与安全模块独立运行，故障切换时间<2ms。
紧急散热系统：支持ASML安全等级（ASML Safety Level 8），透镜组温度超限响应时间≤100ms。
3.行业应用适配性
浸润式光刻机：
透镜组热管理：驱动压电陶瓷加热器实现±0.01℃温度调节，热场均匀性波动≤0.005℃。
洁净室兼容性：通过ISO 14644-1 Class 0洁净室认证，微粒捕获效率≥99.999999%。
量子器件制造：
超低温补偿：集成超导冷却模块，支持-40℃至100℃宽温域控制（补偿精度±0.001℃）。
热噪声抑制：采用量子点热电堆阵列，热噪声降低至传统系统的1/5。
Product brief description
ASML 879-8103-002 is an optical component temperature control core module designed for immersive lithography machines.The core functions include:
Sub-nanometer thermal field regulation:supports temperature fluctuations of the optical lens group≤0.001℃,and the thermal drift compensation accuracy reaches 0.03nm.
Multi-dimensional closed-loop control:integrated infrared thermal imaging array(spatial resolution 0.1mm),piezoelectric ceramic heater(response time<1μs)and laser thermometer(accuracy±0.0005℃).
Anti-interference design:Passed ASML electromagnetic compatibility certification(EMC Class 6),and has an anti-external electromagnetic interference capability of up to 100V/m.
Product details
1.Technical Architecture and Innovation
Distributed thermal management system:
Multi-core collaborative processing:Dual ARM Cortex-M7(main frequency 400MHz)+Xilinx Zynq UltraScale+MPSoC are used,which are responsible for real-time temperature monitoring and algorithm calculation respectively.
Hardware acceleration unit:built-in dedicated PID controller,and the thermal field response speed is increased by 40%.
Communication protocol stack:
EtherCAT master:supports dynamic slave configuration,and the synchronization error between nodes is≤30ns.
ASML private protocol:compatible with the real-time loading of the lithography machine process parameter library(including 800+temperature control process packages).
2.Core functional modules
Optical component temperature control:
Dynamic thermal field compensation:Based on the real-time compensation algorithm of finite element analysis,the thermal drift compensation accuracy reaches 0.03nm.
Purity assurance mechanism:Integrated laser induced breakdown spectroscopy(LIBS)detection,lens surface contaminant concentration control≤10^10 atoms/cm².
Safety control mechanism:
Dual redundant design:the main control board and the security module operate independently,and the failover time is<2ms.
Emergency cooling system:Supports ASML safety level(ASML Safety Level 8),and the lens group temperature exceeds the limit response time≤100ms.
3.Industry application adaptability
Immersive lithography machine:
Lens group thermal management:drives the piezoelectric ceramic heater to achieve temperature regulation of±0.01℃,and the thermal field uniformity fluctuates≤0.005℃.
Clean room compatibility:Passed ISO 14644-1 Class 0 clean room certification,particle capture efficiency≥99.999999%.
Quantum device manufacturing:
Ultra-low temperature compensation:Integrated superconducting cooling module,supports wide temperature domain control from-40℃to 100℃(compensation accuracy±0.001℃).
Thermal noise suppression:Using a quantum dot thermopile array,the thermal noise is reduced to 1/5 of that of traditional systems.
