描述
ENI GHW-12Z射频等离子体发生器是一款专为半导体制造、材料科学及生物医学领域设计的高性能射频电源设备，具备高稳定性、精确控制及智能化管理功能，广泛应用于等离子体刻蚀、薄膜沉积等工艺流程。
一、产品概述
型号：GHW-12Z
频率：13.56 MHz±0.005%，支持208 VAC/400-480 VAC电压输入。
输出功率：1250W（动态范围10-1250W），负载阻抗范围无限，射频稳定性优于-45dBc。
结构设计：模块化控制室安装，采用硬PLC（LD指令处理器），支持自我寻址、定位及I/O自动检测，实现即插即用。
二、核心功能与技术参数
高性能控制
-配备MD Plus控制器，处理速度比M5 Plus控制器快400%，内存容量提升3倍以上，支持神经网络和模型预测控制功能。
-以太网端口支持全双工通信（100MB/s吞吐量），降低CPU负载并提高控制策略容量。
智能化管理
-自我寻址与定位：控制器通电后自动分配网络地址，无需手动配置，表面LED可指示物理位置。
-自动I/O检测：实时识别连接的I/O接口特性，减少配置时间。
-冷重启功能：断电后自动恢复至断电前状态，支持不间断电源（UPS）增强可靠性。
工艺兼容性
-支持等离子增强化学气相沉积（PECVD）、高密度等离子CVD（HDPCVD）、蚀刻等半导体制造工艺。
-适用于集成电路、平板显示器、数据存储设备等领域，确保高良率和重复性。
三、可靠性与认证
防护性能：工作温度0-60℃，湿度0-90%（无凝露），满足工业级环境要求。
认证标准：通过NRTL认证和CE标志，符合全球安全与质量规范。
四、扩展与维护
冗余设计：支持在线冗余控制器备份，实现无缝切换，减少停机时间。
数据管理：自动记录安装与配置信息，支持时间戳、报警和趋势分析，便于故障诊断与工艺优化。
ENI GHW-12Z RF plasma generator is a high-performance RF power supply device designed for semiconductor manufacturing,material science and biomedical fields.It has high stability,precise control and intelligent management functions,and is widely used in plasma etching,thin film deposition and other process flows.
1.Product Overview
Model:GHW-12Z
Frequency:13.56 MHz±0.005%,supports 208 VAC/400-480 VAC voltage input.
Output power:1250W(dynamic range 10-1250W),unlimited load impedance range,RF stability better than-45dBc.
Structural design:modular control room installation,using hard PLC(LD instruction processor),supporting self-addressing,positioning and I/O automatic detection,and realizing plug-and-play.
2.Core functions and technical parameters
High-performance control
-Equipped with MD Plus controller,the processing speed is 400%faster than the M5 Plus controller,the memory capacity is increased by more than 3 times,and it supports neural network and model predictive control functions.
-The Ethernet port supports full-duplex communication(100MB/s throughput),reducing CPU load and increasing control strategy capacity.
Intelligent Management
-Self-addressing and positioning:The controller automatically assigns a network address after power-on,without manual configuration,and the surface LED can indicate the physical location.
-Automatic I/O detection:Real-time identification of the connected I/O interface characteristics to reduce configuration time.
-Cold restart function:Automatically restore to the state before power failure after power failure,supporting uninterruptible power supply(UPS)to enhance reliability.
Process compatibility
-Supports semiconductor manufacturing processes such as plasma enhanced chemical vapor deposition(PECVD),high-density plasma CVD(HDPCVD),and etching.
-Suitable for integrated circuits,flat panel displays,data storage devices and other fields,ensuring high yield and repeatability.
III.Reliability and certification
Protection performance:Working temperature 0-60℃,humidity 0-90%(no condensation),meeting industrial-grade environmental requirements.
Certification standards:NRTL certified and CE marked,in line with global safety and quality regulations.
4.Expansion and maintenance
Redundant design:supports online redundant controller backup,realizes seamless switching and reduces downtime.
Data management:automatically records installation and configuration information,supports timestamp,alarm and trend analysis,and facilitates fault diagnosis and process optimization.
